Magnetic Shields USA will be exhibiting at SPIE Advanced Lithography + Patterning (#SPIElitho), where the semiconductor community comes together to share the latest advancements in lithography, patterning, and process innovation.
Join us February 24–25, 2026, in San Jose, California, and stop by Booth 721 to meet the team and learn how Magnetic Shields USA can help support demanding semiconductor environments. We’ll be on-site to discuss applications where controlling magnetic fields and improving electromagnetic performance can contribute to more stable, repeatable outcomes.
Whether you’re working on next-generation tools, metrology, or process development, we’d love to connect and explore how we can support your goals.
Event: SPIE Advanced Lithography + Patterning 2026
Dates: February 24–25, 2026
Location: San Jose, CA
Booth: 721
Hashtag: #SPIElitho